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Generic approach for synthesizing asymmetric nanoparticles and nanoassemblies

United States Patent

May 26, 2015
View the Complete Patent at the US Patent & Trademark Office
A generic route for synthesis of asymmetric nanostructures. This approach utilizes submicron magnetic particles (Fe.sub.3O.sub.4--SiO.sub.2) as recyclable solid substrates for the assembly of asymmetric nanostructures and purification of the final product. Importantly, an additional SiO.sub.2 layer is employed as a mediation layer to allow for selective modification of target nanoparticles. The partially patched nanoparticles are used as building blocks for different kinds of complex asymmetric nanostructures that cannot be fabricated by conventional approaches. The potential applications such as ultra-sensitive substrates for surface enhanced Raman scattering (SERS) have been included.
Sun; Yugang (Naperville, IL), Hu; Yongxing (Willowbrook, IL)
UChicago Argonne LLC (Chicago, IL)
13/ 621,992
September 18, 2012
STATEMENT OF GOVERNMENT INTEREST The United States Government has rights in the invention described herein pursuant to Contract No. DE-AC02-06CH11357 between the United States Department of Energy and UChicago Argonne, LLC, as operator of Argonne National Laboratory.