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System and method for sealing a vapor deposition source

United States Patent

July 9, 2013
View the Complete Patent at the US Patent & Trademark Office
System and Method for Sealing a Vapor Deposition Source
A system and method for movably sealing a vapor deposition source is described. One embodiment includes a system for coating a substrate, the system comprising a deposition chamber; a vapor pocket located within the deposition chamber; and an at least one movable seal, wherein the at least one movable seal is configured to form a first seal with a first portion of a substrate, and wherein the first seal is configured to prevent a vapor from leaking past the first portion of the substrate out of the vapor pocket. In some embodiments, the movable seal may comprise a first flange, wherein the first flange forms a wall of the vapor pocket; and a second flange, wherein the second flange is configured to be movably disposed within a first groove of the source block.
Enzenroth; Robert A. (Fort Collins, CO), LoBue; Joseph D. (Dale, TX), Knipp; Lawrence J. (Fort Collins, CO)
Colorado State University Research Foundation (Fort Collins, CO)
12/ 762,024
April 16, 2010