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Laser-assisted nanomaterial deposition, nanomanufacturing, in situ monitoring and associated apparatus

United States Patent

November 12, 2013
View the Complete Patent at the US Patent & Trademark Office
Lawrence Berkeley National Laboratory - Visit the Technology Transfer and Intellectual Property Management Department Website
Laser-assisted apparatus and methods for performing nanoscale material processing, including nanodeposition of materials, can be controlled very precisely to yield both simple and complex structures with sizes less than 100 nm. Optical or thermal energy in the near field of a photon (laser) pulse is used to fabricate submicron and nanometer structures on a substrate. A wide variety of laser material processing techniques can be adapted for use including, subtractive (e.g., ablation, machining or chemical etching), additive (e.g., chemical vapor deposition, selective self-assembly), and modification (e.g., phase transformation, doping) processes. Additionally, the apparatus can be integrated into imaging instruments, such as SEM and TEM, to allow for real-time imaging of the material processing.
Mao; Samuel S. (Castro Valley, CA), Grigoropoulos; Costas P. (Berkeley, CA), Hwang; David J. (El Cerrito, CA), Minor; Andrew M. (El Cerrito, CA)
The Regents of the University of California (Oakland, CA)
12/ 743,550
December 16, 2008
STATEMENT OF GOVERNMENTAL SUPPORT The invention described and claimed herein was made in part utilizing funds supplied by the U.S. Department of Energy under Contract Number DE-AC02-05CH11231. The government has certain rights in this invention.