Skip to Content
Find More Like This
Return to Search

Method and apparatus for improved high power impulse magnetron sputtering

United States Patent

8,574,410
November 5, 2013
View the Complete Patent at the US Patent & Trademark Office
Lawrence Berkeley National Laboratory - Visit the Technology Transfer and Intellectual Property Management Department Website
A high power impulse magnetron sputtering apparatus and method using a vacuum chamber with a magnetron target and a substrate positioned in the vacuum chamber. A field coil being positioned between the magnetron target and substrate, and a pulsed power supply and/or a coil bias power supply connected to the field coil. The pulsed power supply connected to the field coil, and the pulsed power supply outputting power pulse widths of greater that 100 .mu.s.
Anders; Andre (El Cerrito, CA)
The Regents of the University of California (Oakland, CA)
12/ 989,378
20110089024
February 17, 2009
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT This invention was made with government support under contract No. De-AC02-05CH11231 awarded by the United States Department of Energy to the Regents of the University of California for management and operation of the Lawrence Berkeley National Laboratory. The government has certain rights in this invention.