Method for nanopatterning of inorganic materials, such as ceramic (e.g. metal oxide) materials, and organic materials, such as polymer materials, on a variety of substrates to form nanopatterns and/or nanostructures with control of dimensions and location, all without the need for etching the materials and without the need for re-alignment between multiple patterning steps in forming nanostructures, such as heterostructures comprising multiple materials. The method involves patterning a resist-coated substrate using electron beam lithography, removing a portion of the resist to provide a patterned resist-coated substrate, and spin coating the patterned resist-coated substrate with a liquid precursor, such as a sol precursor, of the inorganic or organic material. The remaining resist is removed and the spin coated substrate is heated at an elevated temperature to crystallize the deposited precursor material.
CONTRACTUAL ORIGIN OF THE INVENTION
This invention was supported in part by funding from the Federal Government through the National Science Foundation under NSF award no. EEC-0 118025, NSF-MRSEC (DMR #0520513) and the U.S. Department of Energy (DOE-BES) under Contract No. W-31-109-ENG-38. The Government may have certain rights in the invention.