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Light source employing laser-produced plasma

United States Patent

September 17, 2013
View the Complete Patent at the US Patent & Trademark Office
A system and a method of generating radiation and/or particle emissions are disclosed. In at least some embodiments, the system includes at least one laser source that generates a first pulse and a second pulse in temporal succession, and a target, where the target (or at least a portion the target) becomes a plasma upon being exposed to the first pulse. The plasma expand after the exposure to the first pulse, the expanded plasma is then exposed to the second pulse, and at least one of a radiation emission and a particle emission occurs after the exposure to the second pulse. In at least some embodiments, the target is a solid piece of material, and/or a time period between the first and second pulses is less than 1 microsecond (e.g., 840 ns).
Tao; Yezheng (San Diego, CA), Tillack; Mark S. (La Jolla, CA)
The Regents of the University of California (Oakland, CA)
12/ 296,707
April 9, 2007
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT This invention was made with government support under DE-FG03-99ER54547 awarded by Department of Energy. The government has certain rights in this invention.