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Thermochemical nanolithography components, systems, and methods

United States Patent

8,468,611
June 18, 2013
View the Complete Patent at the US Patent & Trademark Office
Improved nanolithography components, systems, and methods are described herein. The systems and methods generally employ a resistively heated atomic force microscope tip to thermally induce a chemical change in a surface. In addition, certain polymeric compositions are also disclosed.
Riedo; Elisa (Atlanta, GA), Marder; Seth R. (Atlanta, GA), de Heer; Walt A. (Atlanta, GA), Szoskiewicz; Robert J. (Manhattan, KS), Kodali; Vamsi K. (Visakhapatnam, IN), Jones; Simon C. (Los Angeles, CA), Okada; Takashi (Mie, JP), Wang; Debin (Atlanta, GA), Curtis; Jennifer E. (Atlanta, GA), Henderson; Clifford L. (Douglasville, GA), Hua; Yueming (Sunnyvale, CA)
Georgia Tech Research Corporation (Atlanta, GA)
12/ 791,466
20110053805
June 1, 2010
STATEMENT OF FEDERALLY SPONSORED RESEARCH This invention was made with United States Government support under Grant Nos. DMR-0120967, DMR-0820382, and DMR-0706031 all awarded by the National Science Foundation and Grant No. DE-FG02-06ER46293 awarded by the Department of Energy. The United States Government has certain rights in this invention.