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Manufacturing method of photonic crystal

United States Patent

January 29, 2013
View the Complete Patent at the US Patent & Trademark Office
A manufacturing method of a photonic crystal is provided. In the method, a high-refractive-index material is conformally deposited on an exposed portion of a periodic template composed of a low-refractive-index material by an atomic layer deposition process so that a difference in refractive indices or dielectric constants between the template and adjacent air becomes greater, which makes it possible to form a three-dimensional photonic crystal having a superior photonic bandgap. Herein, the three-dimensional structure may be prepared by a layer-by-layer method.
Park; In Sung (Seoul, KR), Lee; Tae Ho (Seoul, KR), Ahn; Jin Ho (Seoul, KR), Biswas; Rana (Ames, IA), Constant; Kristen P. (Ames, IA), Ho; Kai-Ming (Ames, IA), Lee; Jae-Hwang (Brookline, MA)
IUCF-HYU Industry-University Cooperation Foundation, Hanyang University (Seoul, KR), Iowa State University Research Foundation, Inc. (Ames, IA)
12/ 227,594
June 1, 2006
This invention was made in part with Government support under Grant Number DE-AC02-07CH11358 awarded by the United States Department of Energy. The Government has certain rights in this invention.