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Fabrication of photonic band gap materials using microtransfer molded templates

United States Patent

April 29, 2003
View the Complete Patent at the US Patent & Trademark Office
Ames Laboratory - Visit the Iowa State University Research Foundation - Office of Intellectual Property & Technology Transfer Website
Method for Creating Photonic Band Gap Materials
A method of manufacturing photonic band gap structures operable in the optical spectrum has been presented. The method comprises the steps of creating a patterned template for an elastomeric mold, fabricating an elastomeric mold from poly-dimethylsiloxane (PDMS) or other suitable polymer, filling the elastomeric mold with a second polymer such as epoxy or other suitable polymer, stamping the second polymer by making contact with a substrate or multilayer structure, removing the elastomeric mold, infiltrating the multilayer structure with ceramic or metal, and heating the multilayer structure to remove the second polymer to form a photonic band gap structure.
Leung; Wai (Ames, IA), Constant; Kristen (Ames, IA), Ho; Kai-Ming (Ames, IA), Sigalas; Mihail (Santa Clara, CA), Kang; Henry (Miami, FL), Kim; Chang Hwan (Ames, IA), Cann; David (Ames, IA), Lee; Jae Hwang (Ames, IA)
Iowa State University Research Foundation (Ames, IA)
10/ 081,729
February 22, 2002
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT This invention was made in part with Government support under DOE Contract No. W-7405-Eng-82 and DOC Contract No. ITA87-02. The government may have certain rights in this invention.