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Ultra-high density diffraction grating

United States Patent

December 11, 2012
View the Complete Patent at the US Patent & Trademark Office
Lawrence Berkeley National Laboratory - Visit the Technology Transfer and Intellectual Property Management Department Website
A diffraction grating structure having ultra-high density of grooves comprises an echellette substrate having periodically repeating recessed features, and a multi-layer stack of materials disposed on the echellette substrate. The surface of the diffraction grating is planarized, such that layers of the multi-layer stack form a plurality of lines disposed on the planarized surface of the structure in a periodical fashion, wherein lines having a first property alternate with lines having a dissimilar property on the surface of the substrate. For example, in one embodiment, lines comprising high-Z and low-Z materials alternate on the planarized surface providing a structure that is suitable as a diffraction grating for EUV and soft X-rays. In some embodiments, line density of between about 10,000 lines/mm to about 100,000 lines/mm is provided.
Padmore; Howard A. (Berkeley, CA), Voronov; Dmytro L. (El Cerrito, CA), Cambie; Rossana (Moraga, CA), Yashchuk; Valeriy V. (Richmond, CA), Gullikson; Eric M. (Oakland, CA)
The Regents of the University of California (Oakland, CA)
12/ 510,900
July 28, 2009
STATEMENT OF GOVERNMENTAL SUPPORT This invention was made with government support under Contract No. DE-AC02-05CH11231 awarded by the United States Department of Energy. The government has certain rights in the invention.