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Method to planarize three-dimensional structures to enable conformal electrodes

United States Patent

November 20, 2012
View the Complete Patent at the US Patent & Trademark Office
Lawrence Livermore National Laboratory - Visit the Industrial Partnerships Office Website
Methods for fabricating three-dimensional PIN structures having conformal electrodes are provided, as well as the structures themselves. The structures include a first layer and an array of pillars with cavity regions between the pillars. A first end of each pillar is in contact with the first layer. A segment is formed on the second end of each pillar. The cavity regions are filled with a fill material, which may be a functional material such as a neutron sensitive material. The fill material covers each segment. A portion of the fill material is etched back to produce an exposed portion of the segment. A first electrode is deposited onto the fill material and each exposed segment, thereby forming a conductive layer that provides a common contact to each the exposed segment. A second electrode is deposited onto the first layer.
Nikolic; Rebecca J. (Oakland, CA), Conway; Adam M. (Livermore, CA), Graff; Robert T. (Modesto, CA), Reinhardt; Catherine (Livermore, CA), Voss; Lars F. (Pleasanton, CA), Shao; Qinghui (Riverside, CA)
Lawrence Livermore National Security, LLC (Livermore, CA)
13/ 014,879
January 27, 2011
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT The United States Government has rights in this invention pursuant to Contract No. DE-AC52-07NA27344 between the U.S. Department of Energy and Lawrence Livermore National Security, LLC, for the operation of Lawrence Livermore National Laboratory.