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Self-assembly of block copolymers on topographically patterned polymeric substrates

United States Patent

August 21, 2012
View the Complete Patent at the US Patent & Trademark Office
Lawrence Berkeley National Laboratory - Visit the Technology Transfer and Intellectual Property Management Department Website
Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.
Russell; Thomas P. (Amherst, MA), Park; Soojin (Amherst, MA), Lee; Dong Hyun (Amherst, MA), Xu; Ting (Berkeley, CA)
The University of Massachusetts (Boston, MA), The Regents of the University of California (Oakland, CA)
12/ 553,484
September 3, 2009
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH & DEVELOPMENT The U.S. Government has certain rights in this invention pursuant to Department of Energy, Office of Basic Energy Sciences Grant No. DE-FG02-96ER45612; Department of Energy, Office of Basic Energy Sciences Grant No. DE-AC02-05CH11231; and National Science Foundation MRSEC on Polymers Grant No. DMR-0213695.