Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH & DEVELOPMENT
The U.S. Government has certain rights in this invention pursuant to Department of Energy, Office of Basic Energy Sciences Grant No. DE-FG02-96ER45612; Department of Energy, Office of Basic Energy Sciences Grant No. DE-AC02-05CH11231; and National Science Foundation MRSEC on Polymers Grant No. DMR-0213695.