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Nanostructure templating using low temperature atomic layer deposition

United States Patent

December 20, 2011
View the Complete Patent at the US Patent & Trademark Office
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Methods are described for making nanostructures that are mechanically, chemically and thermally stable at desired elevated temperatures, from nanostructure templates having a stability temperature that is less than the desired elevated temperature. The methods comprise depositing by atomic layer deposition (ALD) structural layers that are stable at the desired elevated temperatures, onto a template employing a graded temperature deposition scheme. At least one structural layer is deposited at an initial temperature that is less than or equal to the stability temperature of the template, and subsequent depositions made at incrementally increased deposition temperatures until the desired elevated temperature stability is achieved. Nanostructure templates include three dimensional (3D) polymeric templates having features on the order of 100 nm fabricated by proximity field nanopatterning (PnP) methods.
Grubbs; Robert K. (Albuquerque, NM), Bogart; Gregory R. (Corrales, NM), Rogers; John A. (Champaign, IL)
Sandia Corporation (Albuquerque, NM)
11/ 872,749
October 16, 2007
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT The United States Government has certain rights in this invention pursuant to Department of Energy Contract No. DE-AC04-94AL85000 with Sandia Corporation.