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Silicon release coating, method of making same, and method of using same

United States Patent

November 22, 2011
View the Complete Patent at the US Patent & Trademark Office
National Renewable Energy Laboratory - Visit the NREL Technology Transfer Website
A method of making a release coating includes the following steps: forming a mixture that includes (a) solid components comprising (i) 20-99% silicon by weight and (ii) 1-80% silicon nitride by weight and (b) a solvent; applying the mixture to an inner portion of a crucible or graphite board adapted to form an ingot or wafer comprising silicon; and annealing the mixture in a nitrogen atmosphere at a temperature ranging from 1000 to C. The invention may also relate to release coatings and methods of making a silicon ingot or wafer including the use of a release coating.
Jonczyk; Ralf (Wilmington, DE)
Motech Americas, LLC (Newark, DE)
11/ 832,871
August 2, 2007
GOVERNMENT RIGHTS STATEMENT This invention was made with Government support under the Department of Energy Contract No. DE-AC36-99GO10337. Subcontract ZAX-5-33628-06. The Government has certain rights to the invention.