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Nano-soldering to single atomic layer

United States Patent

October 11, 2011
View the Complete Patent at the US Patent & Trademark Office
Lawrence Berkeley National Laboratory - Visit the Technology Transfer and Intellectual Property Management Department Website
A simple technique to solder submicron sized, ohmic contacts to nanostructures has been disclosed. The technique has several advantages over standard electron beam lithography methods, which are complex, costly, and can contaminate samples. To demonstrate the soldering technique graphene, a single atomic layer of carbon, has been contacted, and low- and high-field electronic transport properties have been measured.
Girit; Caglar O. (Berkeley, CA), Zettl; Alexander K. (Kensington, CA)
The Regents of the University of California (Oakland, CA)
12/ 270,643
November 13, 2008
STATEMENT OF GOVERNMENTAL SUPPORT The invention described and claimed herein was made in part utilizing funds supplied by the U.S. Department of Energy under Contract No. DE-AC02-05CH11231 and in part utilizing funds supplied by the National Science Foundation. The Government has certain rights in this invention.