Skip to Content
Find More Like This
Return to Search

Methods for forming particles from single source precursors

United States Patent

August 23, 2011
View the Complete Patent at the US Patent & Trademark Office
Idaho National Laboratory - Visit the Technology Transfer and Commercialization Office Website
Nano Particles – Supercritical Fluid Process
Single source precursors are subjected to carbon dioxide to form particles of material. The carbon dioxide may be in a supercritical state. Single source precursors also may be subjected to supercritical fluids other than supercritical carbon dioxide to form particles of material. The methods may be used to form nanoparticles. In some embodiments, the methods are used to form chalcopyrite materials. Devices such as, for example, semiconductor devices may be fabricated that include such particles. Methods of forming semiconductor devices include subjecting single source precursors to carbon dioxide to form particles of semiconductor material, and establishing electrical contact between the particles and an electrode.
Fox; Robert V. (Idaho Falls, ID), Rodriguez; Rene G. (Pocatello, ID), Pak; Joshua (Pocatello, ID)
Battelle Energy Alliance, LLC (Idaho Falls, ID)
12/ 047,956
March 13, 2008
GOVERNMENT RIGHTS This invention was made with government support under Contract Number DE-AC07-051D14517 awarded by the United States Department of Energy. The government has certain rights in the invention.