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Cluster generator

United States Patent

May 31, 2011
View the Complete Patent at the US Patent & Trademark Office
Described herein is an apparatus and a method for producing atom clusters based on a gas discharge within a hollow cathode. The hollow cathode includes one or more walls. The one or more walls define a sputtering chamber within the hollow cathode and include a material to be sputtered. A hollow anode is positioned at an end of the sputtering chamber, and atom clusters are formed when a gas discharge is generated between the hollow anode and the hollow cathode.
Donchev; Todor I. (Urbana, IL), Petrov; Ivan G. (Champaign, IL)
The Board of Trustees of the University of Illinois (Urbana, IL)
11/ 810,904
June 7, 2007
FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT The United States has contractual rights in this invention pursuant to contract number DE-FG02-91-ER45439 between the U.S. Department of Energy and the University of Illinois at Urbana-Champaign.