Described herein is an apparatus and a method for producing atom clusters based on a gas discharge within a hollow cathode. The hollow cathode includes one or more walls. The one or more walls define a sputtering chamber within the hollow cathode and include a material to be sputtered. A hollow anode is positioned at an end of the sputtering chamber, and atom clusters are formed when a gas discharge is generated between the hollow anode and the hollow cathode.
FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT
The United States has contractual rights in this invention pursuant to contract number DE-FG02-91-ER45439 between the U.S. Department of Energy and the University of Illinois at Urbana-Champaign.