Skip to Content
Find More Like This
Return to Search

Clathrate compounds and method of manufacturing

United States Patent

7,534,414
May 19, 2009
View the Complete Patent at the US Patent & Trademark Office
The present invention comprises new materials, material structures, and processes of fabrication of such that may be used in technologies involving the conversion of light to electricity and/or heat to electricity, and in optoelectronics technologies. The present invention provide for the fabrication of a clathrate compound comprising a type II clathrate lattice with atoms of silicon and germanium as a main framework forming lattice spacings within the framework, wherein the clathrate lattice follows the general formula Si.sub.136-yGe.sub.y, where y indicates the number of Ge atoms present in the main framework and 136-y indicates the number of Si atoms present in the main framework, and wherein y>0.
Nolas; George S. (Tampa, FL), Witanachchi; Sarath (Tampa, FL), Mukherjee; Pritish (Tampa, FL)
University of South Florida (Tampa, FL)
12/ 104,016
20080226836
April 16, 2008
STATEMENT OF GOVERNMENT INTEREST This invention was made with Government support under Grant No. DE-FG02-04ER46146 awarded by the United States Department of Energy. The Government has certain rights in the invention.