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Optical method for the characterization of laterally patterned samples in integrated circuits

United States Patent

March 17, 2009
View the Complete Patent at the US Patent & Trademark Office
Disclosed is a method for characterizing a sample having a structure disposed on or within the sample, comprising the steps of applying a first pulse of light to a surface of the sample for creating a propagating strain pulse in the sample, applying a second pulse of light to the surface so that the second pulse of light interacts with the propagating strain pulse in the sample, sensing from a reflection of the second pulse a change in optical response of the sample, and relating a time of occurrence of the change in optical response to at least one dimension of the structure.
Maris; Humphrey J. (Barrington, RI)
Brown University (Providence, RI)
12/ 072,841
February 28, 2008
This invention was made with government support under grant number DEFG02-ER45267 awarded by the Department of Energy. The government has certain rights in the invention.