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Apparatus and method for removing solvent from carbon dioxide in resin recycling system

United States Patent

January 6, 2009
View the Complete Patent at the US Patent & Trademark Office
Sandia National Laboratories - Visit the Intellectual Property Management and Licensing Website
A two-step resin recycling system and method solvent that produces essentially contaminant-free synthetic resin material. The system and method includes one or more solvent wash vessels to expose resin particles to a solvent, the solvent contacting the resin particles in the one or more solvent wash vessels to substantially remove contaminants on the resin particles. A separator is provided to separate the solvent from the resin particles after removal from the one or more solvent wash vessels. The resin particles are next exposed to carbon dioxide in a closed loop carbon dioxide system. The closed loop system includes a carbon dioxide vessel where the carbon dioxide is exposed to the resin, substantially removing any residual solvent remaining on the resin particles after separation. A separation vessel is also provided to separate the solvent from the solvent laden carbon dioxide. Both the carbon dioxide and the solvent are reused after separation in the separation vessel.
Bohnert; George W. (Harrisonville, MO), Hand; Thomas E. (Lee's Summit, MO), DeLaurentiis; Gary M. (Jamestown, CA)
Honeywell Federal Manufacturing & Technologies, LLC (Kansas City, MO)
11/ 733,590
April 10, 2007
GOVERNMENT SPONSORED DEVELOPMENT The U.S. Government has rights in this invention pursuant to contract number DE-ACO4-01AL66850 with the United States Department of Energy.