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Solvent cleaning system and method for removing contaminants from solvent used in resin recycling

United States Patent

7,473,758
January 6, 2009
View the Complete Patent at the US Patent & Trademark Office
Sandia National Laboratories - Visit the Intellectual Property Management and Licensing Website
A two step solvent and carbon dioxide based system that produces essentially contaminant-free synthetic resin material and which further includes a solvent cleaning system for periodically removing the contaminants from the solvent so that the solvent can be reused and the contaminants can be collected and safely discarded in an environmentally safe manner.
Bohnert; George W. (Harrisonville, MO), Hand; Thomas E. (Lee's Summit, MO), DeLaurentiis; Gary M. (Jamestown, CA)
Honeywell Federal Manufacturing & Technologies, LLC (Kansas City, MO)
11/ 426,530
20060287213
June 26, 2006
GOVERNMENT SPONSORED DEVELOPMENT The U.S. Government has rights in this invention pursuant to contract number DE-ACO4-01AL66850 with the United States Department of Energy.