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Epitaxial growth of aligned AlGalnN nanowires by metal-organic chemical vapor deposition

United States Patent

August 5, 2008
View the Complete Patent at the US Patent & Trademark Office
Highly ordered and aligned epitaxy of III-Nitride nanowires is demonstrated in this work. <1010> M-axis is identified as a preferential nanowire growth direction through a detailed study of GaN/AlN trunk/branch nanostructures by transmission electron microscopy. Crystallographic selectivity can be used to achieve spatial and orientational control of nanowire growth. Vertically aligned (Al)GaN nanowires are prepared on M-plane AlN substrates. Horizontally ordered nanowires, extending from the M-plane sidewalls of GaN hexagonal mesas or islands demonstrate new opportunities for self-aligned nanowire devices, interconnects, and networks.
Han; Jung (Woodbridge, CT), Su; Jie (New Haven, CT)
Yale University (New Haven, CT)
11/ 207,226
August 19, 2005
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT This invention was partially made with U.S. Government support from the Department of Energy Contract No. DE-FC26-03NT41941 and National Science Foundation Research Award No. ECS-0304468. Accordingly, the U.S. Government may have certain rights in this invention.