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Selection and deposition of nanoparticles using CO.sub.2-expanded liquids

United States Patent

June 10, 2008
View the Complete Patent at the US Patent & Trademark Office
A method for size selection of nanostructures comprising utilizing a gas-expanded liquids (GEL) and controlled pressure to precipitate desired size populations of nanostructures, e.g., monodisperse. The GEL can comprise CO.sub.2 antisolvent and an organic solvent. The method can be carried out in an apparatus comprising a first open vessel configured to allow movement of a liquid/particle solution to specific desired locations within the vessel, a second pressure vessel, a location controller for controlling location of the particles and solution within the first vessel, a inlet for addition of antisolvent to the first vessel, and a device for measuring the amount of antisolvent added. Also disclosed is a method for forming nanoparticle thin films comprising utilizing a GEL containing a substrate, pressurizing the solution to precipitate and deposit nanoparticles onto the substrate, removing the solvent thereby leaving a thin nanoparticle film, removing the solvent and antisolvent, and drying the film.
Roberts; Christopher B. (Auburn, AL), McLeod; Marshall Chandler (Hillsboro, OR), Anand; Madhu (Auburn, AL)
Auburn University (Auburn, AL)
11/ 237,601
September 27, 2005
ACKNOWLEDGEMENTS This invention was made with government support under funding by the Department of Energy Basic Energy Sciences (DE-FG02-01 ER15255) and the National Science Foundation (CTS-0207781). The government may have certain rights in the invention.