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Composition and method for removing photoresist materials from electronic components

United States Patent

7,381,694
June 3, 2008
View the Complete Patent at the US Patent & Trademark Office
Los Alamos National Laboratory - Visit the Technology Transfer Division Website
Composition and method for removing photoresist materials from electronic components. The composition is a mixture of at least one dense phase fluid and at least one dense phase fluid modifier. The method includes exposing a substrate to at least one pulse of the composition in a supercritical state to remove photoresist materials from the substrate.
Davenhall; Leisa B. (Santa Fe, NM), Rubin; James B. (Los Alamos, NM), Taylor; Craig M. V. (Jemez Springs, NM)
Los Alamos National Security, LLC (Los Alamos, NM)
11/ 034,519
20050124516
January 11, 2005
STATEMENT REGARDING FEDERAL RIGHTS This invention was made with government support under Contract No. W-7405-ENG-36 awarded by the U.S. Department of Energy. The government has certain rights in the invention.