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United States Patent

March 13, 2007
View the Complete Patent at the US Patent & Trademark Office
Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is accomplished by patterning block copolymer templates with selective exposure to a radiation source. The resulting multi-scale lithographic template can be treated with post-fabrication steps to produce multilevel, three-dimensional, integrated nanoscale media, devices, and systems.
Tuominen; Mark (Shutesbury, MA), Bal; Mustafa (Amherst, MA), Russell; Thomas P. (Amherst, MA), Ursache; Andrei (Amherst, MA)
University of Massachusetts (Boston, MA)
10/ 098,222
March 14, 2002
GOVERNMENT RIGHTS This invention was made with government support under U.S. Department of Energy Grant No. DE-FG02-96ERA45612, U.S. National Science Foundation Grant No. DMR-9809365, and U.S. National Science Foundation Grant No. CTS-9871782. The government has certain rights in this invention.