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Method and apparatus for fabricating a thin-film solar cell utilizing a hot wire chemical vapor deposition technique

United States Patent

7,122,736
October 17, 2006
View the Complete Patent at the US Patent & Trademark Office
National Renewable Energy Laboratory - Visit the NREL Technology Transfer Website
Hot-Wire Chemical Vapor Deposition (HWCVD) technologies
A thin-film solar cell is provided. The thin-film solar cell comprises an a-SiGe:H (1.6 eV) n-i-p solar cell having a deposition rate of at least ten (10) .ANG./second for the a-SiGe:H intrinsic layer by hot wire chemical vapor deposition. A method for fabricating a thin film solar cell is also provided. The method comprises depositing a n-i-p layer at a deposition rate of at least ten (10) .ANG./second for the a-SiGe:H intrinsic layer.
Wang; Qi (Littleton, CO), Iwaniczko; Eugene (Lafayette, CO)
Midwest Research Institute (Kansas City, MO)
10/ 485,715
20040168717
August 16, 2001
CONTRACTUAL ORIGIN OF THE INVENTION The United States Government has rights in this invention under Contract No. DE-AC36-99GO10337 between the United States Department of Energy and the National Renewable Energy Laboratory, a division of the Midwest Research Institute.