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Inductively generated streaming plasma ion source

United States Patent

July 25, 2006
View the Complete Patent at the US Patent & Trademark Office
A novel pulsed, neutralized ion beam source is provided. The source uses pulsed inductive breakdown of neutral gas, and magnetic acceleration and control of the resulting plasma, to form a beam. The beam supplies ions for applications requiring excellent control of ion species, low remittance, high current density, and spatial uniformity.
Glidden; Steven C. (Freeville, NY), Sanders; Howard D. (Ithaca, NY), Greenly; John B. (Lansing, NY)
Applied Pulsed Power, Inc. (Ithaca, NY)
10/ 974,622
October 27, 2004
ACKNOWLEDGMENT OF GOVERNMENT SUPPORT This invention was made with Government support under Grant No. DE-FG02-01ER83147, awarded by the Department of Energy. The government has certain rights in the invention.