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System for generating two-dimensional masks from a three-dimensional model using topological analysis

United States Patent

June 20, 2006
View the Complete Patent at the US Patent & Trademark Office
Sandia National Laboratories - Visit the Intellectual Property Management and Licensing Website
A method of generating two-dimensional masks from a three-dimensional model comprises providing a three-dimensional model representing a micro-electro-mechanical structure for manufacture and a description of process mask requirements, reducing the three-dimensional model to a topological description of unique cross sections, and selecting candidate masks from the unique cross sections and the cross section topology. The method further can comprise reconciling the candidate masks based on the process mask requirements description to produce two-dimensional process masks.
Schiek; Richard (Albuquerque, NM)
Sandia Corporation (Albuquerque, NM)
10/ 671,116
September 24, 2003
STATEMENT OF GOVERNMENT INTEREST The invention was developed under Contract DE-AC04-94AL85000 between Sandia Corporation and the U.S. Department of Energy. The U.S. government has certain rights in this invention.