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Lithography process for patterning HgI2 photonic devices

United States Patent

November 23, 2004
View the Complete Patent at the US Patent & Trademark Office
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A photolithographic process forms patterns on HgI.sub.2 surfaces and defines metal sublimation masks and electrodes to substantially improve device performance by increasing the realizable design space. Techniques for smoothing HgI.sub.2 surfaces and for producing trenches in HgI.sub.2 are provided. A sublimation process is described which produces etched-trench devices with enhanced electron-transport-only behavior.
Mescher; Mark J. (Auburndale, MA), James; Ralph B. (Livermore, CA), Hermon; Haim (Jerusalem, IL)
Sandia National Laboratories (Livermore, CA)
09/ 712,082
November 13, 2000
The United States Government has rights in this invention pursuant to Contract No. DE-AC04-94AL85000 between the United States Department of Energy and Sandia Corporation for the operation of Sandia National Laboratories.