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Patterning of nanocrystalline diamond films for diamond microstructures useful in MEMS and other devices

United States Patent

November 2, 2004
View the Complete Patent at the US Patent & Trademark Office
Argonne National Laboratory - Visit the Technology Development and Commercialization Website
MEMS structure and a method of fabricating them from ultrananocrystalline diamond films having average grain sizes of less than about 10 nm and feature resolution of less than about one micron . The MEMS structures are made by contacting carbon dimer species with an oxide substrate forming a carbide layer on the surface onto which ultrananocrystalline diamond having average grain sizes of less than about 10 nm is deposited. Thereafter, microfabrication process are used to form a structure of predetermined shape having a feature resolution of less than about one micron.
Gruen; Dieter M. (Downers Grove, IL), Busmann; Hans-Gerd (Bremen, DE), Meyer; Eva-Maria (Bremen, DE), Auciello; Orlando (Bolingbrook, IL), Krauss; Alan R. (late of Naperville, IL), Krauss; Julie R. (Naperville, IL)
The University of Chicago (Chicago, IL)
10/ 169,879
November 8, 2002
CONTRACTUAL ORIGIN OF THE INVENTION The United States Government has rights in this invention pursuant to Contract No. W-31-109-ENG-38 between the U.S. Department of Energy (DOE) and The University of Chicago representing Argonne National Laboratory.