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Method & apparatus for monitoring plasma processing operations

United States Patent

October 19, 2004
View the Complete Patent at the US Patent & Trademark Office
Sandia National Laboratories - Visit the Intellectual Property Management and Licensing Website
The invention generally relates to various aspects of a plasma process and, more specifically, to the monitoring of such plasma processes. One aspect relates to a plasma monitoring module that may be adjusted in at least some manner so as to re-evaluate a previously monitored plasma process. For instance, optical emissions data on a plasma process that was previously monitored by the plasma monitoring module may be replayed through the plasma monitoring module after making at least one adjustment in relation to the plasma monitoring module.
Smith, Jr.; Michael Lane (Albuquerque, NM), Ward; Pamela Denise Peardon (Rio Rancho, NM), Stevenson; Joel O'Don (Albuquerque, NM)
Sandia Corporation (Albuquerque, NM)
10/ 108,193
March 27, 2002
GOVERNMENT RIGHTS The U.S. Government has rights in this invention pursuant to Contract No. DE-AC04-94AL85000 between the Department of Energy and Sandia Corporation.