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Focused electron and ion beam systems

United States Patent

July 27, 2004
View the Complete Patent at the US Patent & Trademark Office
Lawrence Berkeley National Laboratory - Visit the Technology Transfer and Intellectual Property Management Department Website
An electron beam system is based on a plasma generator in a plasma ion source with an accelerator column. The electrons are extracted from a plasma cathode in a plasma ion source, e.g. a multicusp plasma ion source. The beam can be scanned in both the x and y directions, and the system can be operated with multiple beamlets. A compact focused ion or electron beam system has a plasma ion source and an all-electrostatic beam acceleration and focusing column. The ion source is a small chamber with the plasma produced by radio-frequency (RF) induction discharge. The RF antenna is wound outside the chamber and connected to an RF supply. Ions or electrons can be extracted from the source. A multi-beam system has several sources of different species and an electron beam source.
Leung; Ka-Ngo (Hercules, CA), Reijonen; Jani (Oakland, CA), Persaud; Arun (Berkeley, CA), Ji; Qing (Berkeley, CA), Jiang; Ximan (El Cerrito, CA)
The Regents of the University of California (Oakland, CA)
10/ 232,502
August 30, 2002
GOVERNMENT RIGHTS The United States Government has rights in this invention pursuant to Contract No. DE-AC03-76SF00098 between the United States Department of Energy and the University of California.