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Long working distance interference microscope

United States Patent

April 13, 2004
View the Complete Patent at the US Patent & Trademark Office
Sandia National Laboratories - Visit the Intellectual Property Management and Licensing Website
Disclosed is a long working distance interference microscope suitable for three-dimensional imaging and metrology of MEMS devices and test structures on a standard microelectronics probe station. The long working distance of 10-30 mm allows standard probes or probe cards to be used. This enables nanometer-scale 3-D height profiles of MEMS test structures to be acquired across an entire wafer. A well-matched pair of reference/sample objectives is not required, significantly reducing the cost of this microscope, as compared to a Linnik microinterferometer.
Sinclair; Michael B. (Albuquerque, NM), DeBoer; Maarten P. (Albuquerque, NM), Smith; Norman F. (Albuquerque, NM)
Sandia Corporation (Albuquerque, NM)
09/ 800,047
March 5, 2001
FEDERALLY SPONSORED RESEARCH The United States Government has rights in this/invention pursuant to Department of Energy Contract No. DE-AC04-94AL85000 with Sandia Corporation.