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Method for improving the stability of amorphous silicon

United States Patent

March 30, 2004
View the Complete Patent at the US Patent & Trademark Office
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A method of producing a metastable degradation resistant amorphous hydrogenated silicon film is provided, which comprises the steps of growing a hydrogenated amorphous silicon film, the film having an exposed surface, illuminating the surface using an essentially blue or ultraviolet light to form high densities of a light induced defect near the surface, and etching the surface to remove the defect.
Branz; Howard M. (Boulder, CO)
Midwest Research Institute (Kansas City, MO)
09/ 714,331
November 16, 2000
CONTRACTUAL ORIGIN OF THE INVENTION The United States Government has rights in this invention pursuant to Contract No. DE-AC36-99GO10337 between the United States Department of Energy and the Midwest Research Institute.