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EUV mirror based absolute incident flux detector

United States Patent

March 23, 2004
View the Complete Patent at the US Patent & Trademark Office
Sandia National Laboratories - Visit the Intellectual Property Management and Licensing Website
A device for the in-situ monitoring of EUV radiation flux includes an integrated reflective multilayer stack. This device operates on the principle that a finite amount of in-band EUV radiation is transmitted through the entire multilayer stack. This device offers improvements over existing vacuum photo-detector devices since its calibration does not change with surface contamination.
Berger; Kurt W. (Livermore, CA)
EUV, LLC (Santa Clara, CA)
09/ 956,397
September 18, 2001
This invention was made with Government support under Contract No. DE-AC04-94-AL85000 awarded by the U.S. Department of Energy to Sandia Corporation. The Government has certain rights to the invention.