Skip to Content
Find More Like This
Return to Search

Method of produce ultra-low friction carbon films

United States Patent

April 15, 2003
View the Complete Patent at the US Patent & Trademark Office
Argonne National Laboratory - Visit the Technology Development and Commercialization Website
A method and article of manufacture of amorphous diamond-like carbon. The method involves providing a substrate in a chamber, providing a mixture of a carbon containing gas and hydrogen gas with the mixture adjusted such that the atomic molar ratio of carbon to hydrogen is less than 0.3, including all carbon atoms and all hydrogen atoms in the mixture. A plasma is formed of the mixture and the amorphous diamond-like carbon film is deposited on the substrate. To achieve optimum bonding an intervening bonding layer, such as Si or SiO.sub.2, can be formed from SiH.sub.4 with or without oxidation of the layer formed.
Erdemir; Ali (Naperville, IL), Fenske; George R. (Downers Grove, IL), Eryilmaz; Osman Levent (Istanbul, TK), Lee; Richard H. (Lemont, IL)
Argonne National Laboratory (Argonne, IL)
09/ 808,632
March 14, 2001
This invention was made with Government support under Contract No. W-31-109-ENG-38 awarded by the Department of Energy. The Government has certain rights in this invention.