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Regeneration of strong-base anion-exchange resins by sequential chemical displacement

United States Patent

September 10, 2002
View the Complete Patent at the US Patent & Trademark Office
Oak Ridge National Laboratory - Visit the Partnerships Directorate Website
A method for regenerating strong-base anion exchange resins utilizing a sequential chemical displacement technique with new regenerant formulation. The new first regenerant solution is composed of a mixture of ferric chloride, a water-miscible organic solvent, hydrochloric acid, and water in which tetrachloroferrate anion is formed and used to displace the target anions on the resin. The second regenerant is composed of a dilute hydrochloric acid and is used to decompose tetrachloroferrate and elute ferric ions, thereby regenerating the resin. Alternative chemical displacement methods include: (1) displacement of target anions with fluoroborate followed by nitrate or salicylate and (2) displacement of target anions with salicylate followed by dilute hydrochloric acid. The methodology offers an improved regeneration efficiency, recovery, and waste minimization over the conventional displacement technique using sodium chloride (or a brine) or alkali metal hydroxide.
Brown; Gilbert M. (Knoxville, TN), Gu; Baohua (Oak Ridge, TN), Moyer; Bruce A. (Oak Ridge, TN), Bonnesen; Peter V. (Knoxville, TN)
U.T. Battelle, LLC (Oak Ridge, TN)
09/ 491,242
January 25, 2000
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH This invention was made with United States Government support under Contract No. DE-AC05-96OR22464 awarded by the Department of Energy to Lockheed Martin Energy Research Corporation and the United States Government has certain rights in this invention.