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Method for fabricating an ultra-low expansion mask blank having a crystalline silicon layer

United States Patent

April 9, 2002
View the Complete Patent at the US Patent & Trademark Office
Sandia National Laboratories - Visit the Intellectual Property Management and Licensing Website
A method for fabricating masks for extreme ultraviolet lithography (EUVL) using Ultra-Low Expansion (ULE) substrates and crystalline silicon. ULE substrates are required for the necessary thermal management in EUVL mask blanks, and defect detection and classification have been obtained using crystalline silicon substrate materials. Thus, this method provides the advantages for both the ULE substrate and the crystalline silicon in an Extreme Ultra-Violet (EUV) mask blank. The method is carried out by bonding a crystalline silicon wafer or member to a ULE wafer or substrate and thinning the silicon to produce a 5-10 .mu.m thick crystalline silicon layer on the surface of the ULE substrate. The thinning of the crystalline silicon may be carried out, for example, by chemical mechanical polishing and if necessary or desired, oxidizing the silicon followed by etching to the desired thickness of the silicon.
Cardinale; Gregory F. (Oakland, CA)
EUV LLC (Santa Clara, CA)
09/ 540,585
March 31, 2000
GOVERNMENT RIGHTS The United States Government has rights in this invention pursuant to Contract No. DE-ACO4-94AL85000 between the United States Department of Energy and the Sandia Corporation for the operation of the Sandia National Laboratories.