Skip to Content
Find More Like This
Return to Search

Fabrication of photonic band gap materials

United States Patent

6,339,030
January 15, 2002
View the Complete Patent at the US Patent & Trademark Office
Ames Laboratory - Visit the Iowa State University Research Foundation - Office of Intellectual Property & Technology Transfer Website
A method for forming a periodic dielectric structure exhibiting photonic band gap effects includes forming a slurry of a nano-crystalline ceramic dielectric or semiconductor material and monodisperse polymer microspheres, depositing a film of the slurry on a substrate, drying the film, and calcining the film to remove the polymer microspheres therefrom. The film may be cold-pressed after drying and prior to calcining. The ceramic dielectric or semiconductor material may be titania, and the polymer microspheres may be polystyrene microspheres.
Constant; Kristen (Ames, IA), Subramania; Ganapathi S. (Ames, IA), Biswas; Rana (Ames, IA), Ho; Kai-Ming (Ames, IA)
The United States of America as represented by the United States Department of Energy (Washington, DC)
09/ 477,191
January 5, 2000
GRANT REFERENCE This invention was made with Government support under contracts No. W-7405-Eng-82 (DOE-ISU) awarded by the Department of Energy and No. ITA87-02 (DOC-ISU) awarded by the Department of Commerce. The Government has certain rights in the invention.