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Fabrication of photonic band gap materials

United States Patent

January 15, 2002
View the Complete Patent at the US Patent & Trademark Office
Ames Laboratory - Visit the Iowa State University Research Foundation - Office of Intellectual Property & Technology Transfer Website
A method for forming a periodic dielectric structure exhibiting photonic band gap effects includes forming a slurry of a nano-crystalline ceramic dielectric or semiconductor material and monodisperse polymer microspheres, depositing a film of the slurry on a substrate, drying the film, and calcining the film to remove the polymer microspheres therefrom. The film may be cold-pressed after drying and prior to calcining. The ceramic dielectric or semiconductor material may be titania, and the polymer microspheres may be polystyrene microspheres.
Constant; Kristen (Ames, IA), Subramania; Ganapathi S. (Ames, IA), Biswas; Rana (Ames, IA), Ho; Kai-Ming (Ames, IA)
The United States of America as represented by the United States Department of Energy (Washington, DC)
09/ 477,191
January 5, 2000
GRANT REFERENCE This invention was made with Government support under contracts No. W-7405-Eng-82 (DOE-ISU) awarded by the Department of Energy and No. ITA87-02 (DOC-ISU) awarded by the Department of Commerce. The Government has certain rights in the invention.