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Method for correcting imperfections on a surface

United States Patent

September 7, 1999
View the Complete Patent at the US Patent & Trademark Office
Sandia National Laboratories - Visit the Intellectual Property Management and Licensing Website
A process for producing near perfect optical surfaces. A previously polished optical surface is measured to determine its deviations from the desired perfect surface. A multi-aperture mask is designed based on this measurement and fabricated such that deposition through the mask will correct the deviations in the surface to an acceptable level. Various mask geometries can be used: variable individual aperture sizes using a fixed grid for the apertures or fixed aperture sizes using a variable aperture spacing. The imperfections are filled in using a vacuum deposition process with a very thin thickness of material such as silicon monoxide to produce an amorphous surface that bonds well to a glass substrate.
Sweatt; William C. (Albuquerque, NM), Weed; John W. (Albuquerque, NM)
Sandia Corporation (Albuquerque, NM)
08/ 850,665
May 1, 1997
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT This invention was made with Government support under Contract DE-AC04-95AL85000 awarded by the U.S. Department of Energy. The Government has certain rights in this invention.