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Plasma enhanced chemical vapor deposition vanadium oxide thin films

United States Patent Application

20030022065
A1
View the Complete Application at the US Patent & Trademark Office
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Thin-film vanadium oxide layer that is suitable for use as a cathode in a lithium ion battery or other electronic applications, such as ion insertion layers in electrochromic devices as well as other uses, is deposited by a plasma-enhanced chemical vapor deposition at room temperature at rates as high as 11 .ANG./sec. from a vanadium-containing precursor reacted with oxygen and hydrogen. The vanadium oxide-based cathode produced by a lower temperature process and at a high deposition rate, exhibits a high discharge capacity, a high energy density, and a negligible capacity fade fiom its second cycle to at least 2,900 cycles, thus providing enhanced cyclic stability and an improved component for rechargeable lithium-ion batteries and other electronic devices.
Zhang, Ji-Guang (Marietta, GA), Tracy, C. Edwin (Golden, CO), Benson, David K. (Golden, CO), Turner, John A. (Littleton, CO), Liu, Ping (Lakewood, CO)
10/ 180,861
October 4, 2002
[0002] The United States Government has rights in this invention pursuant of Contract No. DEAC 36-99 GO10337 between the United States Department of Energy and the National Renewable Energy Laboratory, a division of the Midwest Research Institute.