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Silicon Oxynitride Coating Compositions

United States Patent Application

20090277782
A1
View the Complete Application at the US Patent & Trademark Office
Oak Ridge National Laboratory - Visit the Partnerships Directorate Website
Silicon oxynitride compositions are described herein. These compositions are typically deposited onto substrates using a nitrogen plasma-based, reactive sputtering method. Depending on their composition, these coatings can be used for field emission suppression, dielectric applications, reflection control, and surface passivation.
Theodore, Nimel (Alexandria, VA), Holloway, Brian C. (Danville, VA), Manos, Dennis M. (Williamsburg, VA)
COLLEGE OF WILLIAM AND MARY (Williamsburg VA)
12/ 507,460
July 22, 2009
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH AND DEVELOPMENT [0002] This invention was made with government support under Grant No. DE-AC05-84ER-40150 awarded by the Department of Energy. The government has certain rights in the invention.