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METHOD AND APPARATUS FOR HIGH-PRESSURE ATOMIC-BEAM LASER INDUCED DEPOSITION/ETCHING

United States Patent Application

20090110848
A1
View the Complete Application at the US Patent & Trademark Office
Los Alamos National Laboratory - Visit the Technology Transfer Division Website
A method for carrying out pulsed laser deposition is disclosed. The method comprises providing a target having a desired composition; irradiating the target with a pulsed laser beam to provide a plume of target material; and directing the plume in a desired direction by use of an inert carrier gas. The plume of target material is passed through an aperture to create an atomic beam. One or both of the plume or the atomic beam is irradiated to reduce the amount of agglomerated particles in the atomic beam. The atomic beam is directed onto a substrate to produce a deposition product. An apparatus for carrying out the method is also disclosed.
MAXWELL, James L. (Jemez Springs, NM), SPRINGER, Robert W. (Los Alamos, NM)
LOS ALAMOS NATIONAL SECURITY, LLC (Los Alamos NM)
11/ 923,788
October 25, 2007
STATEMENT REGARDING FEDERAL RIGHTS [0001] This invention was made with government support under Contract No. DE-AC52-06NA25396 awarded by the U.S. Department of Energy. The government has certain rights in the invention.