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NANOPARTICLE DEPOSITION IN POROUS AND ON PLANAR SUBSTRATES

United States Patent Application

20180023211
A1
View the Complete Application at the US Patent & Trademark Office
A method of preparing a metal nanoparticle on a surface includes subjecting a metal source to a temperature and a pressure in a carrier gas selected to provide a vapor metal species at a vapor pressure in the range of about 10.sup.-4 to about 10.sup.-11 atm; contacting the vapor metal species with a heated substrate; and depositing the metal as a nanoparticle on the substrate.
PAL, Uday B. (Dover, MA), BASU, Soumendra (Westwood, MA), GASPER, Paul (Watertown, MA), LU, Yanchen (Boston, MA), GOPALAN, Srikanth (Westborough, MA)
15/ 654,152
July 19, 2017
GOVERNMENT SUPPORT [0002] This invention was made with government support under Grant No. DE-FE0026096 awarded by The Department of Energy. The government has certain rights in the invention.