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Lithographic Patterning

United States Patent Application

20170108778
A1
View the Complete Application at the US Patent & Trademark Office
Brookhaven National Laboratory - Visit the Office of Technology Commercialization and Partnerships Website
This disclosure provides embodiments of an approach that enforces coexistence of multiple, aligned block copolymer morphologies within a single patterning layer.
Black, Charles Thomas (New York, NY), Stein, Aaron (Huntington Station, NY), Wright, Gwen (Medford, NY), Yager, Kevin G. (East Setauket, NY)
15/ 269,202
September 19, 2016
STATEMENT OF GOVERNMENT RIGHTS [0002] This invention was made with Government support under contract number DE-AC02-98CH10886 and DE-SC0012704 awarded by the U.S. Department of Energy. The Government has certain rights in the invention.