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NANOSCALE SOFC ELECTRODE ARCHITECTURE ENGINEERED USING ATOMIC LAYER DEPOSITION

United States Patent Application

20170062799
A1
View the Complete Application at the US Patent & Trademark Office
One embodiment includes forming surface-modifying phases on a surface of a functional electrode via atomic layer deposition and controlling the chemistry of constituent phases, the crystalline nature of the constituent phases and the thickness of the surface-modifying phase via the atomic layer deposition such that the thickness is between about 2 nm to about 200 nm. The surface-modifying phases enhances the performance of electrocatalytic activity of the functional electrode and the device.
Song, Xueyan (Morgantown, WV), Chen, Yun (Morgantown, WV), Gerdes, Kirk (Morgantown, US), Lee, Shiwoo (Morgantown, WV)
14/ 814,881
July 31, 2015
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT [0002] This invention was made with government support under agreement DE-FE0004000 and DE-FE0023386 awarded by the National Energy Technology Laboratory, and agreement DE-FC26-05NT42248 awarded by the National Academy of Sciences. The Government has certain rights in the invention.