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DYNAMIC APERTURE FOR THREE-DIMENSIONAL CONTROL OF THIN-FILM DEPOSITION AND ION-BEAM EROSION

United States Patent Application

20170044661
A1
View the Complete Application at the US Patent & Trademark Office
A dynamic aperture system includes at least one baffle array including a plurality of baffle elements, at least one source configured to provide atoms for differential deposition or ions for differential erosion, and an actuator configured to independently translate each baffle element in order to selectively modify at least one of a shape or size of an aperture formed in the baffle array in real-time.
Conley, Raymond P. (Mokena, IL), Windt, David (New York, NY)
UChicago Argonne, LLC (Chicago IL)
15/ 234,792
August 11, 2016
STATEMENT OF GOVERNMENT INTEREST [0002] The United States Government claims certain rights in this invention pursuant to Contract No. DE-AC02-06CH11357 between the U.S. Department of Energy and UChicago Argonne, LLC, as operator of Argonne National Laboratories.