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INTENSE X-RAY AND EUV LIGHT SOURCE

United States Patent Application

*** PATENT GRANTED ***
20160302294
9,686,844
A1
View the Complete Application at the US Patent & Trademark Office
Los Alamos National Laboratory - Visit the Technology Transfer Division Website
An intense X-ray or EUV light source may be driven by the Smith-Purcell effect. The intense light source may utilize intense electron beams and Bragg crystals. This may allow the intense light source to range from the extreme UV range up to the hard X-ray range.
Coleman, Joshua (Santa Fe, NM), Ekdahl, Carl (Santa Fe, NM), Oertel, John (Los Alamos, NM)
Los Alamos National Security, LLC
15/ 088,366
April 1, 2016
STATEMENT OF FEDERAL RIGHTS [0002] The United States government has rights in this invention pursuant to Contract No. DE-AC52-06NA25396 between the United States Department of Energy and Los Alamos National Security, LLC for the operation of Los Alamos National Laboratory.