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METHODS TO INTRODUCE SUB-MICROMETER, SYMMETRY-BREAKING SURFACE CORRUGATION TO SILICON SUBSTRATES TO INCREASE LIGHT TRAPPING

United States Patent Application

*** PATENT GRANTED ***
20160284886
9,530,906
A1
View the Complete Application at the US Patent & Trademark Office
Provided is a method for fabricating a nanopatterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.
Han, Sang Eon (Albuquerque, NM), Hoard, Brittany R. (Albuquerque, NM), Han, Sang M. (Albuquerque, NM), Ghosh, Swapnadip (Albuquerque, NM)
15/ 030,039
October 17, 2014
GOVERNMENT SUPPORT STATEMENT [0002] This invention was made with government support under the Oak Ride Associated Universities (ORAU) Ralph E. Powe Junior Faculty Enhancement Award during the period of Jun. 1, 2013 and May 31, 2014 (no award number was issued), and under the National Science Foundation Sustainable Energy Pathways (NSF-SEP) Program Grant No. CHE-1231046. The government has certain rights in the invention.