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Methods For Fabricating Magnetic Devices And Associated Systems And Devices

United States Patent Application

View the Complete Application at the US Patent & Trademark Office
A method for exposing a photoresist material to light includes the following steps: (1) optically coupling the light to an optical mask via a prism and a first liquid layer joining the prism and the optical mask, (2) masking the light using the optical mask, and (3) optically coupling the masked light to the photoresist material. The method is used, for example, to fabricate a magnetic device on a semiconductor substrate. A hybrid semiconductor and magnetic device includes a semiconductor substrate and a top insulating structure deposited on an outer surface of the semiconductor substrate. The top insulating structure has opposing first and second sloping sidewalls, where each sloping sidewall forms an acute angle of at least 30 degrees, relative to an axis normal to the outer surface of the semiconductor substrate. The hybrid semiconductor and magnetic device further includes a magnetic core surrounding the top insulating structure.
Sullivan, Charles R. (West Lebanon, NH), Harburg, Daniel V. (Hanover, NH), Levey, Christopher G. (Thetford Center, VT), Yue, Song (West Lebanon, NH)
14/ 898,367
June 13, 2014
GOVERNMENT RIGHTS [0002] This invention was made with government support under contract number DE-AR0000123 awarded by the Department of Energy Advanced Research Project Agency. The government has certain rights in the invention.